Chapter 1

General Information

Introduction

NX-Interferom is Park Systems' proprietary metrology platform, inheriting the foundation of NX-Hybrid White Light Interferometry (WLI) and redefining interferometry with integrated Atomic Force Microscopy (AFM) technology. The term "Interferom" combines interferometry with Park's proprietary system design, representing a unique approach beyond conventional optical metrology.

NX-Interferom is a leading-edge, multi-scale metrology system that combines AFM, Atomic Force Profiler (AFP), and WLI in a single platform. WLI provides high-throughput, large-area imaging, while AFM and AFP deliver sub-nanometer precision for detailed surface characterization. This multi-modal approach — combining WLI with AFM for cross-validated surface profile measurement — has been established in advanced metrology workflows for sub-wavelength feature characterization ^[1].

Park's proven AFM technology directly enhances WLI performance by using the AFM Z-scanner for optical height scanning. This configuration enables precise optical control and produces smooth image stitching with minimal overlap between neighboring images. A motorized dual-objective turret further adds versatility, allowing users to switch easily between wide field-of-view imaging and high-resolution imaging, addressing the broader industry need for rapid, non-destructive 3D nanometrology ^[2].

NX-Interferom delivers reliable sub-nanometer precision through Park AFM's proprietary technologies, including minimized out-of-plane motion via a decoupled XY scan system, precise orthogonality and positioning with independent dual-servo XY control, fast vertical response enabled by a high-resonance-frequency Z scanner, and extended tip life through True Non-Contact™ scanning.

NX-Interferom is designed to meet SEMI standards for seamless integration into semiconductor fabs, enabling end-to-end automation from wafer loading to measurement, analysis, and unloading. It has been adopted by major semiconductor manufacturers worldwide.

Figure 1.1 NX-Interferom

References

[1] C. Delacroix, P. Forsberg, M. Karlsson, D. Mawet, C. Lenaerts, S. Habraken, C. Hanot, J. Surdej, A. Boccaletti, and J. Baudrand, "Annular Groove Phase Mask coronagraph in diamond for mid-IR wavelengths: manufacturing assessment and performance analysis," arXiv preprint arXiv:1412.0395, 2014. [Online]. Available: https://arxiv.org/abs/1412.0395

[2] D. Balakrishnan, S. W. Chee, Z. Baraissov, M. Bosman, U. Mirsaidov, and N. D. Loh, "Single-shot, coherent, pop-out 3D metrology," arXiv preprint arXiv:2209.07930, 2022. [Online]. Available: https://arxiv.org/abs/2209.07930